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1 photoresist process
фотолітографія, оптична літографіяEnglish-Ukrainian dictionary of microelectronics > photoresist process
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2 process
1. ім.1) процес; (технологічний) метод, спосіб2) технологія (див. т-ж technique, technology)3) (технологічна) обробка; технологічна операція2. дієсл. обробляти; проводити технологічну операцію - all-ion-implant process
- all-planar process
- Auger process
- batch process
- BH bias and hardness process
- BH process
- bonding process
- BOX process
- bulk CMOS process
- bumping process
- chip-on-board process
- closed CMOS process
- CMOS-on-sapphire process
- composite сеll logic process
- contact process
- conventional process
- deep охide isolation process
- DIFET process
- diffused eutectic aluminum process
- direct synthesis and crystal pull process
- double-diffused process
- double ion-implanted process
- double-layer polysilicon gate MOS process
- double-layer polysilicon gate process
- epitaxial deposition process
- epitaxial process
- epitaxial growth process
- flip-over process
- floating-gate silicon process
- front-end process
- gold-doped process
- guard-banded CMOS process
- heterogeneous process
- high-voltage process
- HMOS process
- imaging process
- implantation process
- in-house process
- interconnection process
- inverted meniscus process
- ion plating process
- isoplanar -S, -Z, -2 process
- isoplanar process
- junction-isolated process
- laser-recrystallized process
- lithographic process
- low-pressure process
- low VT process
- lost wafer process
- major process
- masking process
- master slice process
- mesa-isolation process
- metal-gate MOS process
- metal-gate process
- microbipolar LSI process
- micrometer-dimension process
- mid-film process
- Minimod process
- Mo-gate MOS process
- Mo-gate process
- nitride process
- nitrideless process
- NSA process
- oxide-film isolation process
- oxide isolated process
- oxygen refilling process
- patterning process
- phosphorous buried-emitter process
- photoablative process
- photolithography process
- photoresist process
- planar oxidation process
- Planox process
- plasma etch process
- Poly I process
- Poly II process
- Poly 5 process
- poly-oxide process
- Poly-Si process
- polysilicon-gate process
- poly-squared MOS process
- proprietary process
- PSA bipolar process
- PSA process
- refractory metal MOS process
- refractory metal process
- sacrificial охide process
- sapphire dielectric isolation process
- scaled Poly 5 process
- screen-and-fire process
- selective field-охidation process
- self-aligned gate process
- self-aligned process
- self-registered gate process
- self-registered process
- semi-additive process
- semiconductor-thermoplastic-dielectric process
- semicustom process
- shadow masking process
- silk-screen process
- single poly process
- SMOS process
- SOS/CMOS process
- stacked fuse bipolar process
- Stalicide process
- step-and-repeat process
- subtractive-fabrication process
- surface process
- Telemos process
- thermal process
- thermally асtivated surface process
- thermal-охidation process
- three-mask process
- triple-diffused process
- triply-poly process
- twin-tub process
- twin-well process
- V-groove MOS process
- V-groove process
- wet process
- 3-D process -
3 pattern
1. ім.1) малюнок; зображення; образ; рельєф2) конфігурація, форма2. дієсл. формувати малюнок; формувати зображення; формувати рельєф; структурувати - chip pattern
- circuit pattern
- computer-generated pattern
- conductive pattern
- conductor pattern
- contact pattern
- contiguous-disk propagation pattern
- customized metallization pattern
- discretionary wiring pattern
- dislocation pattern
- domain pattern
- dopant pattern
- electron-beam pattern
- electron diffraction pattern
- emitter pattern
- error-free layout pattern
- etchedpattern
- etchpattern
- fine-line pattern
- fine-linewidth pattern
- fixed-interconnection pattern
- gate pattern
- geometric pattern
- growth pattern
- high-aspect ratio pattern
- insulation pattern
- integrated-circuit pattern
- interconnection mask pattern
- layout pattern
- lead pattern
- mask pattern
- masked реrmalloy pattern
- masking pattern
- master pattern
- measurement pattern
- metal-finger pattern
- multiple pattern
- optical pattern
- oxide pattern
- permalloy propagation pattern
- photographic emulsion-maskpattern
- photographic emulsionpattern
- photoresist film pattern
- photoresist pattern
- photoresist mask pattern
- process evaluation and control pattern
- programmed-interconnection pattern
- regular pattern
- repetitive pattern
- reticle pattern
- routing pattern
- shifting test pattern
- silicon pattern
- step coverage pattern
- striation pattern
- subisolation pattern
- sunken охide pattern
- surface relief pattern
- test pattern
- thick-film pattern
- thin-film pattern
- transistor pattern
- wafer pattern
- wiring pattern -
4 etching
травлення (див. т-ж etch) - anisotropic etching
- anode etching
- batch etching
- blanket etching
- chemically assisted etching
- concentration dependent etching
- crystallographically sensitive etching
- deep reactive ion etching DRIE
- deep reactive ion etching
- differential etching
- digital etching
- diode ion etching
- diode etching
- dip etching
- directional etching
- dislocation etching
- dry process etching
- dry etching
- electron-beam induced etching
- excessive etching
- exciraer laser etching
- gas-phase plasma-assisted etching
- high-frequency ion etching
- hydrogen reactive ion etching
- ion etching
- ion-assisted plasma etching
- ion-beam induced etching
- isotropic etching
- jet etching
- laser-enhanced etching
- laser-induced pattern projection etching
- laser radical etching
- lateral etching
- lift-off etching
- light-induced etching
- low-pressure plasma etching
- low-pressure etching
- masked etching
- maskless etching
- maskless laser etching
- mesa etching
- microwave plasma etching
- microwave etching
- mild etching
- nonundercutting etching
- orientation-dependent etching
- oxygen gas plasma etching
- permeation etching
- photochemical etching
- photoelectrochemical etching
- photo-enhanced chemical dry etching
- photoexcited etching
- photo-initiated etching
- photoresist-masked etching
- plasma reactor etching
- plasma etching
- post etching
- preferential etching
- radical plasma etching
- radical etching
- radio-frequency plasma etching
- reactive ion etching
- regenerative etching
- resistless etching
- selective etching
- sharp etching
- sideways etching
- single-step laser etching
- spray etching
- sputter etching
- steady-state etching
- synchrotron radiation-assisted etching
- taper etching
- tetrode ion etching
- tetrode etching
- triode ion etching
- triode etching
- undercuttingetching
- undercutetching
- UV laser etching
- vacuum ultraviolet-assisted etching
- vertical etching
- VUV-assisted etching
- wet chemical etching
- wet etching
- zero-undercut etching -
5 processing
1) (технологічна) обробка; проведення процесу 2) технологія (див. т-ж process, technique, technology) 3) обробка (інформації) - array processing
- batch-modeprocessing
- batchprocessing
- beam processing
- bipolar processing
- chip processing
- CMOS/SOS processing
- component pre-insertion processing
- component processing
- computer word processing
- digital image processing
- dry processing
- electroless processing
- electron-beam processing
- epitaxial processing
- excimer laser processing
- exposive-shock processing
- fabrication processing
- hands-off processing
- high-resolution processing
- high-temperature processing
- high-volume processing
- high-yield processing
- image processing
- in-line processing
- ion-beam processing
- ion-implantation processing
- isothermal processing
- laser cold processing
- liquid chemical processing
- liquid processing
- lithographic processing
- maskless processing
- microelectronic processing
- microgravity processing
- MOS processing
- multimask processing
- multi-User MEMS processing MUMPS
- multi-User MEMS processing
- multiple-chemical processing
- on-line data processing
- pel-to-pel processing
- photochemical processing
- photoresist processing
- pipeline processing
- planar processing
- planar plasma processing
- plasma processing
- post ion-implantation processing
- pyrolytic laser processing
- radiation-free processing
- relief-mask processing
- single-wafer semiconductor processing
- single-wafer processing
- slice-at-a-time processing
- space semiconductor processing
- submicrometer processing
- submicron processing ї
- TAB processing
- temperature-gradient zone-melting processing
- thermal processing
- unattended processing
- vacuum infrared processing
- vertical processing
- wafer-by-wafer processing
- wet chemical processing
- wet processingEnglish-Ukrainian dictionary of microelectronics > processing
См. также в других словарях:
self-aligned photoresist process — susitapatinančioji fotolitografija statusas T sritis radioelektronika atitikmenys: angl. self aligned photoresist process vok. selbstjustierende Fotolithografie, f rus. самосовмещённая фотолитография, f pranc. photolithographie à auto alignement … Radioelektronikos terminų žodynas
photoresist — [fōt΄ō ri zist′] n. a substance that can be made to form a tough film by a photographic process, used to mask electrical circuits before chemical etching … English World dictionary
Photoresist — A photoresist is a light sensitive material used in several industrial processes, such as photolithography and photoengraving to form a patterned coating on a surface. Contents 1 Photoresist categories 1.1 Tone 1.2 Developing light wavelength … Wikipedia
SU-8 photoresist — For the heavy Soviet ground attack aircraft, see Sukhoi Su 8 SU 8 Photoresist descriptionSU 8 is a commonly used negative photoresist. It is a very viscous polymer that can be spun or spread over a thickness ranging from 1 micrometer up to 2… … Wikipedia
LIGA-Process — Procédé LIGA Le LIGA Process, ou procédé LIGA est un procédé utilisé pour la fabrication de microsystèmes, développé vers la fin des années 70 au Kernforschungszentrum Karlsruhe (KfK). Ce procédé a originellement été développé dans le cadre de… … Wikipédia en Français
photolithographie à auto-alignement — susitapatinančioji fotolitografija statusas T sritis radioelektronika atitikmenys: angl. self aligned photoresist process vok. selbstjustierende Fotolithografie, f rus. самосовмещённая фотолитография, f pranc. photolithographie à auto alignement … Radioelektronikos terminų žodynas
selbstjustierende Fotolithografie — susitapatinančioji fotolitografija statusas T sritis radioelektronika atitikmenys: angl. self aligned photoresist process vok. selbstjustierende Fotolithografie, f rus. самосовмещённая фотолитография, f pranc. photolithographie à auto alignement … Radioelektronikos terminų žodynas
susitapatinančioji fotolitografija — statusas T sritis radioelektronika atitikmenys: angl. self aligned photoresist process vok. selbstjustierende Fotolithografie, f rus. самосовмещённая фотолитография, f pranc. photolithographie à auto alignement, f … Radioelektronikos terminų žodynas
самосовмещённая фотолитография — susitapatinančioji fotolitografija statusas T sritis radioelektronika atitikmenys: angl. self aligned photoresist process vok. selbstjustierende Fotolithografie, f rus. самосовмещённая фотолитография, f pranc. photolithographie à auto alignement … Radioelektronikos terminų žodynas
Photolithography — For earlier uses of photolithography in printing, see Lithography. For the same process applied to metal, see Photochemical machining. Photolithography (or optical lithography ) is a process used in microfabrication to selectively remove parts of … Wikipedia
Multiple patterning — is a class of technologies developed for photolithography to enhance the feature density. The simplest case of multiple patterning is double patterning, where a conventional lithography process is enhanced to produce double the expected number of … Wikipedia
